Data Mining Systems for the Semiconductor Industry

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Input Parameter SPC for Diffusion Furnaces Stephen Munley, National Semiconductor (UK) Ltd., Greenock, Scotland Jon Goldman, Jon Goldman Associates, Inc., Orange, CA.

Abstract Lack of visibility of important information for process and equipment engineers in the diffusion area made improving the processes and systems very difficult. Hours were being spent troubleshooting non-problems, while the real instabilities often went unnoticed. In an attempt to improve the productivity of our troubleshooting and process improvement activities, a project to implement a Real Time Input Parameter SPC System was begun. Examples of the methodology used and results obtained are given. To date, the project has been successful in helping maintain tighter process control and facilitate proactive maintenance operations. Recommendations for further improvements to automate the delivery SPC information are given. Email us to request this article.